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期刊


ISSN0947-076X
刊名Vakuum in Forschung und Praxis
参考译名真空研究与实践
收藏年代1998~2025



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1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2017
2018 2019 2020 2021 2022 2023
2024 2025

2001, vol.13, no.1 2001, vol.13, no.2 2001, vol.13, no.3 2001, vol.13, no.4 2001, vol.13, no.5 2001, vol.13, no.6

题名作者出版年年卷期
Wear resistant modified diamond like carbon coatings with non-sticking propertiesA. Hieke20012001, vol.13, no.1
Why evaporation under vacuum?G. Klinke20012001, vol.13, no.1
Advanced barrier systems for copper metallization in high integrated circuitsC. Wenzel; H. -J. Engelmann20012001, vol.13, no.1
Application of physical analysis techniques for thin film and interface characterization in semicondouctor industryEhrenfried Zschech; Eckhard Langer; Hans-Jurgen Engelmann; Kornelia Dittmar; Werner Blum20012001, vol.13, no.1
Transparent and conductive oxide layersB. Szyszka20012001, vol.13, no.1
Integration of digitally controlled total pressure measurement systems into vakuum equipmentJ. Bottcher; F. Pfeifer; A. Schopphoff20012001, vol.13, no.1