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期刊


issn1063-7397
刊名Russian Microelectronics
中译刊名《俄罗斯微电子学》
简介俄罗斯期刊《微电子学》(736P0020)的英文翻译版。高价刊。
收藏年代2002-

全部

2002 2003 2004 2005 2006 2007
2008 2009 2010 2011 2012 2013
2014 2015 2016 2017 2018


题名作者出版年年卷期
Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical DimensionA. V. Myakonkikh; K. Yu. Kuvaev; A. A. Tatarintsev; N. A. Orlikovskii; K. V. Rudenko; O. P. Guschin; E. S. Gornev20182018, vol.47, no.5
Implementation of a Two-Qubit C-NOT Quantum Gate in a System of Two Double Quantum Dots, a Microcavity, and a LaserA. V. Tsukanov; V. G. Chekmachev20182018, vol.47, no.5
Nanosecond-Pulse Annealing of Heavily Doped Ge:Sb Layers on Ge SubstratesR. I. Batalov; R. M. Bayazitov; H. A. Novikov; I. A. Faizrakhmanov; V. A. Shustov; G. D. Ivlev20182018, vol.47, no.5
Reliability Investigation of 0.18-μm SOI MOS Transistors at High TemperaturesA. S. Benediktov; P. V. Ignatov; A. A. Mikhailov; A. G. Potupchik20182018, vol.47, no.5
Applications of the Technology of Fast Neutral Particle Beams in Micro- and NanoelectronicsYu. P. Maishev; V. P. Kudrya20182018, vol.47, no.5
Investigation of Characteristics of Electrostatically Actuated MEMS Switch with an Active Contact Breaking MechanismI. V. Uvarov; A. N. Kupriyanov20182018, vol.47, no.5
Analytic Model of Transit-Time Diodes and Transistors for the Generation and Detection of THz RadiationV. V. Vyurkov; R. R. Khabutdinov; A. B. Nemtsov; I. A. Semenikhin; M. K. Rudenko; K. V. Rudenko; V. F. Lukichev20182018, vol.47, no.5
The Model of the Process of the Chemical Mechanical Polishing of the Copper Metallization, Based on the Formation of the Passivation LayerT. M. Makhviladze; M. E. Sarychev20182018, vol.47, no.5
Investigation of a Capacitor Array of a Composite Capacitive Touch PanelA. I. Vlasov; A. I. Krivoshein; D. S. Terent’ev; V. A. Shakhnov20182018, vol.47, no.5
The Effect of the Mixture Composition on the Electrophysical Parameters of HCl/N2PlasmaS. A. Pivovarenok20182018, vol.47, no.4
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