先进制造业知识服务平台
国家科技图书文献中心机械分馆  工信部产业技术基础公共服务平台  国家中小企业公共服务示范平台

OA期刊


ISSN1070-664X
刊名Physics of plasmas
出版商American Institute of Physics



全部

2021 2022 2024 2025

2021, vol.28, no.1 2021, vol.28, no.10 2021, vol.28, no.11 2021, vol.28, no.12 2021, vol.28, no.2 2021, vol.28, no.3
2021, vol.28, no.4 2021, vol.28, no.5 2021, vol.28, no.6 2021, vol.28, no.7 2021, vol.28, no.8 2021, vol.28, no.9

题名作者出版年年卷期
On quasineutral plasma flow in the magnetic nozzleA. I. Smolyakov;A. Sabo;P. Yushmanov;S. Putvinskii;20212021, vol.28, no.6
High-fidelity kinetic modeling of instabilities and gyromotion physics in nonuniform low-beta plasmasG. V. Vogman;J. H. Hammer;20212021, vol.28, no.6
Equations and improved coefficients for parallel transport in multicomponent collisional plasmas: Method and application for tokamak modelingS. O. Makarov;D. P. Coster;V. A. Rozhansky;A. A. Stepanenko;V. M. Zhdanov;E. G. Kaveeva;I. Y. Senichenkov;X. Bonnin;20212021, vol.28, no.6
Injection of positrons into a dense electron cloud in a magnetic dipole trapM. Singer;M. R. Stoneking;E. V. Stenson;S. Nißl;A. Deller;A. Card;J. Horn-Stanja;T. Sunn Pedersen;H. Saitoh;C. Hugenschmidt;20212021, vol.28, no.6
Erratum: “Solving the problem of overdetermination of quasisymmetric equilibrium solutions by near-axis expansions. II. Circular axis stellarator solutions”E. Rodríguez;A. Bhattacharjee;20212021, vol.28, no.6
Publisher's Note: “Finite gyroradius multidimensional electron hole equilibria”I. H. Hutchinson;20212021, vol.28, no.6
Response to “Comment on ‘A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma’”Young-Cheol Kim;Hyun-Jun Kim;Hyo-Chang Lee;Chin-Wook Chung;20212021, vol.28, no.6
Comment on “A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma”Z. F. Ding;20212021, vol.28, no.6
Computing the Paschen curve for argon with speed-limited particle-in-cell simulationJoseph G. Theis;Gregory R. Werner;Thomas G. Jenkins;John R. Cary;20212021, vol.28, no.6
Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency biasMin Young Yoon;H. J. Yeom;Jung Hyung Kim;Won Chegal;Yong Jai Cho;Deuk-Chul Kwon;Jong-Ryul Jeong;Hyo-Chang Lee;20212021, vol.28, no.6
12