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OA期刊
ISSN
1070-664X
刊名
Physics of plasmas
出版商
American Institute of Physics
全部
2021
2022
2024
2025
2021, vol.28, no.1
2021, vol.28, no.10
2021, vol.28, no.11
2021, vol.28, no.12
2021, vol.28, no.2
2021, vol.28, no.3
2021, vol.28, no.4
2021, vol.28, no.5
2021, vol.28, no.6
2021, vol.28, no.7
2021, vol.28, no.8
2021, vol.28, no.9
题名
作者
出版年
年卷期
On quasineutral plasma flow in the magnetic nozzle
A. I. Smolyakov;A. Sabo;P. Yushmanov;S. Putvinskii;
2021
2021, vol.28, no.6
High-fidelity kinetic modeling of instabilities and gyromotion physics in nonuniform low-beta plasmas
G. V. Vogman;J. H. Hammer;
2021
2021, vol.28, no.6
Equations and improved coefficients for parallel transport in multicomponent collisional plasmas: Method and application for tokamak modeling
S. O. Makarov;D. P. Coster;V. A. Rozhansky;A. A. Stepanenko;V. M. Zhdanov;E. G. Kaveeva;I. Y. Senichenkov;X. Bonnin;
2021
2021, vol.28, no.6
Injection of positrons into a dense electron cloud in a magnetic dipole trap
M. Singer;M. R. Stoneking;E. V. Stenson;S. Nißl;A. Deller;A. Card;J. Horn-Stanja;T. Sunn Pedersen;H. Saitoh;C. Hugenschmidt;
2021
2021, vol.28, no.6
Erratum: “Solving the problem of overdetermination of quasisymmetric equilibrium solutions by near-axis expansions. II. Circular axis stellarator solutions”
E. Rodríguez;A. Bhattacharjee;
2021
2021, vol.28, no.6
Publisher's Note: “Finite gyroradius multidimensional electron hole equilibria”
I. H. Hutchinson;
2021
2021, vol.28, no.6
Response to “Comment on ‘A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma’”
Young-Cheol Kim;Hyun-Jun Kim;Hyo-Chang Lee;Chin-Wook Chung;
2021
2021, vol.28, no.6
Comment on “A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma”
Z. F. Ding;
2021
2021, vol.28, no.6
Computing the Paschen curve for argon with speed-limited particle-in-cell simulation
Joseph G. Theis;Gregory R. Werner;Thomas G. Jenkins;John R. Cary;
2021
2021, vol.28, no.6
Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias
Min Young Yoon;H. J. Yeom;Jung Hyung Kim;Won Chegal;Yong Jai Cho;Deuk-Chul Kwon;Jong-Ryul Jeong;Hyo-Chang Lee;
2021
2021, vol.28, no.6
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