先进制造业知识服务平台
国家科技图书文献中心机械分馆　　工信部产业技术基础公共服务平台　　国家中小企业公共服务示范平台

期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2007, vol.25, no.1 2007, vol.25, no.2 2007, vol.25, no.3 2007, vol.25, no.4 2007, vol.25, no.5 2007, vol.25, no.6

题名作者出版年年卷期
Beyond β-C{sub}3N{sub}4-Fullerene-like carbon nitride: A promising coating materialJorg Neidhardt; Lars Hultman20072007, vol.25, no.4
CO-D{sub}2O coadlayers on Pt(111): Vibrational studies at low coveragesYuhai Hu; Peter R. Norton; Keith Griffiths20072007, vol.25, no.4
Effects of substrate bias and nitrogen flow ratio on the resistivity and crystal structure of reactively sputtered ZrN{sub}x films at elevated temperatureJ. S. Jeng; S. H. Wang; J. S. Chen20072007, vol.25, no.4
Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layersL. Stafford; W. T. Lim; S. J. Pearton; M. Chicoine; S. Gujrathi; F. Schiettekatte; Jae-Soung Park; Ju-Il Song; Young-Woo Heo; Joon-Hyung Lee; Jeong-Joo Kim; I. I. Kravchenko20072007, vol.25, no.4
Role of energy in Sow-temperature high-rate formation of hydrophilic TiO{sub}2 thin films using pulsed magnetron sputteringJ. Musil; J. Sicha; D. Herman; R. Cerstvy20072007, vol.25, no.4
Influence of electron irradiation and heating on secondary electron yields from non-evaporable getter films observed with in situ X-ray photoelectron spectroscopyMichiru Nishiwaki; Shigeki Kato20072007, vol.25, no.4
Atomic simulation of SiC etching by energetic SiF{sub}3F. Gou; Meng Chuanliang; Chen Lingzhouting; Qiu Qian20072007, vol.25, no.4
Thermally regulated valve for minute flowsHugo Nguyen; Johan Bejhed; Johan Kohier; Greger Thornell20072007, vol.25, no.4
Fabrication of long-range surface plasmon-polariton waveguides in lithium niobate on siliconGreg Mattiussi; Nancy Lahoud; Robert Charbonneau; Pierre Berini20072007, vol.25, no.4
Characterizations of InN films on Si(111) substrate grown by metal-organic chemical vapor deposition with a predeposited In layer and a two-step growth methodK. J. Chang; J. Y. Chang; M. C. Chen; S. M. Lahn; C. J. Kao; Z. Y. Li; W. Y. Uen; G. C. Chi20072007, vol.25, no.4
12345678910...



国家科技图书文献中心  全球文献资源网  京ICP备05055788号-26  京公网安备11010202008970号  机械工业信息研究院 2018-2024