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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2004, vol.22, no.1 2004, vol.22, no.2 2004, vol.22, no.3 2004, vol.22, no.4 2004, vol.22, no.5 2004, vol.22, no.6

题名作者出版年年卷期
Prediction of SiC etching in a NF{sub}3/CH{sub}4 plasma using neural networkByungwhan Kim; Byung Teak Lee20042004, vol.22, no.6
Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO{sub}2 surfacesYoshie Kimura; J. W. Coburn; David B. Graves20042004, vol.22, no.6
Investigation of fluorocarbon plasma deposition from c-C{sub}4F{sub}8 for use as passivation during deep silicon etchingCatherine B. Labelle; Vincent M. Donnelly; Gregory R. Bogart; Robert L. Opila; Avi Kornblit20042004, vol.22, no.6
Interface formation during the yttrium oxide deposition on Si by pulsed liquid-injection plasma enhanced metal-organic chemical vapor depositionC. Durand; C. Valiee; C. Dubourdieu; E. Gautier; M. Bonvalot; O. Joubert20042004, vol.22, no.6
InN epitaxial growths on Yttria stabilized zirconia (111) step substratesT. Honke; H. Fujioka; J. Ohta; M. Oshima20042004, vol.22, no.6
Near-infrared diode laser hydrogen fluoride monitor for dielectric etchNing Xu; David R. Pirkie; Jay B. Jeffries; Brian McMillin; Ronald K. Hanson20042004, vol.22, no.6
Structure characterization and photon absorption analysis Of carbon-doped β-FeSi{sub}2 filmXiaona Li; Dong Nie; Chuang Dong; Lei Xu; Ze Zhang20042004, vol.22, no.6
Formation and analysis of disk-shaped grains by Ni-mediated crystallization of amorphous siliconKyung Ho Kim; Jae Hwan Oh; Eun Hyun Kim; Jin Jang20042004, vol.22, no.6
Two-dimensional spatial survey of the plasma potential and electric field in a pulsed bipolar magnetron dischargeA. Vetushka; S. K. Karkari; J. W. Bradley20042004, vol.22, no.6
Growth and surface characterization of V{sub}2O{sub}5 thin films made by pulsed-laser depositionC. V. Ramana; R. J. Smith; O. M. Hussain; C. M. Julien20042004, vol.22, no.6
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