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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2004, vol.22, no.1 2004, vol.22, no.2 2004, vol.22, no.3 2004, vol.22, no.4 2004, vol.22, no.5 2004, vol.22, no.6

题名作者出版年年卷期
Comparison of pulsed and downstream deposition of fluorocarbon materials from C{sub}3F{sub}8 and c-C{sub}4F{sub}8 plasmasInaT. Martin; Galiya Sh. Malkov; Carmen I. Butoi; Ellen R. Fisher20042004, vol.22, no.2
Study of C{sub}4F{sub}8/CO and C{sub}4F{sub}8/Ar/CO plasmas for highly selective etchingLi Ling; X. Hua; X. Li; G. S. Oehrlein; F. G. Celii; K. H. R. Kirmse; P. Jiang; Yicheng Wang; H. M. Anderson20042004, vol.22, no.2
Control of nitrogen depth profile In ultrathin oxynitride films formed by pufse-tlme-modulated nitrogen beamsSeiji Samukawa; Youichi Minemura; Seiichi Fukuda20042004, vol.22, no.2
Preparation of TIN films by arc ion plating using dc and pulsed biasesM. D. Huang; Y. P. Lee; C. Dong; G. Q. Lin; C. Sun; L. S. Wen20042004, vol.22, no.2
Some considerations on heater designJ. J. Chen; B. W. Tao; X. Z. Liu; Y. R. Li20042004, vol.22, no.2
Plasma characteristics In pulsed direct current reactive magnetron sputtering of aluminum nitride thin filmsJung W. Lee; Jerome J. Cuomo; Mohamed Bourham20042004, vol.22, no.2
Reactive physical vapor deposition of JlxMyH: Integrated plasma-surfs modeling characterizationDa Zhang; J. K. Schaeffer20042004, vol.22, no.2
Zirconia-afymina nanolamlrsate for perforated pitting corrosion protection of stainless steelW. F. Gaertner; E. E. Hoppe; M. A. Omari; R. S. Sorbello; C. R. Aita20042004, vol.22, no.2
Phase transformation of tungsten films deposited by diode and inductively coupled plasma magnetron sputteringG. S. Chen; H. S. Tian; C. K. Lin; Gin-Shiang Chen; H. Y. Lee20042004, vol.22, no.2
Characterization of graded InGaN/GaN epllayers grown on sapphireT. L. Song; S. J. Chua; E. A. Fitzgerald; P. Chen; S. Tripathy20042004, vol.22, no.2
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