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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2002, vol.20, no.1
2002, vol.20, no.2
2002, vol.20, no.3
2002, vol.20, no.4
2002, vol.20, no.5
2002, vol.20, no.6
题名
作者
出版年
年卷期
Refractive index control of silicon nitride films prepared by radio-frequency reactive sputtering
P. S. Nayar
2002
2002, vol.20, no.6
Low temperature deposition of α-Al{sub}2O{sub}3 thin films by sputtering using a Cr{sub}2O{sub}3 template
P. Jin; G. Xu; M. Tazawa; K. Yoshimura; D. Music; J. Alami; U. Helmersson
2002
2002, vol.20, no.6
High-sensitivity X-ray photoelectron spectroscopy characterization of a quantum device structure
M. Wintrebert-Fouquet; K. S. A. Butcher
2002
2002, vol.20, no.6
Effect of surface polymerization on plasma and process stability in polycrystalline-silicon etching
Songlin Xu; Thorsten Lill; Shashank Deshmukh; Olivier Joubert
2002
2002, vol.20, no.6
Conductance calculation of a long tube with equilateral triangle cross section
Ping Fan; Ji-Guo Chu; Jian-Da Shao
2002
2002, vol.20, no.6
Dramatic change of electrical properties in La-Ba-Mn-O thin films prepared using bias sputtering
Jong Cheol Lee; Sang Yu Ie; Seung Iel Park; Yeongjin Yi; Gyu In Jang; Ho Shik Song; Dong Gyun You; Kwangho Jeong
2002
2002, vol.20, no.6
Plasma-surface kinetics and simulation of feature profile evolution in Cl{sub}2+HBr etching of polysilicon
Weidong Jin; Steven A. Vitale; Herbert H. Sawin
2002
2002, vol.20, no.6
Photoelastic modulation-reflection absorption infrared spectroscopy of CO on Pd(111)
D. Stacchiola; A. W. Thompson; M. Kaltchev; W. T. Tysoe
2002
2002, vol.20, no.6
Atomic layer deposition of zirconium silicate films using zirconium tetrachloride and tetra-n-butyl orthosilicate
Won-Kyu Kim; Sang-Woo Kang; Shi-Woo Rhee; Nae-In Lee; Jong-Ho Lee; Ho-Kyu Kang
2002
2002, vol.20, no.6
Correlation between structure, stress and deposition parameters in direct current sputtered zinc oxide films
O. Kappertz; R. Drese; M. Wuttig
2002
2002, vol.20, no.6
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