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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2002, vol.20, no.1
2002, vol.20, no.2
2002, vol.20, no.3
2002, vol.20, no.4
2002, vol.20, no.5
2002, vol.20, no.6
题名
作者
出版年
年卷期
Void formation during silicidation and its influence on the thermal stability of cobalt silicide
Nam-Sik Kim; Han-Seob Cha; Nag-Kyun Sung; Hyuk-Hyun Ryu; Ki-Seog Youn; Won-Gyu Lee
2002
2002, vol.20, no.4
Model for a multiple-step deep Si etch process
Shahid Rauf; William J. Dauksher; Stephen B. Clemens; Kenneth H. Smith
2002
2002, vol.20, no.4
Bi epitaxy on polar InSb(111) A/B faces
Sunglae Cho; Young-Ho Um; Yunki Kim; George K. L. Wong; J. B. Ketterson; Jung-Il Hong
2002
2002, vol.20, no.4
Maintaining reproducible plasma reactor wall conditions: SF{sub}6 plasma cleaning of films deposited on chamber walls during Cl{sub}2/O{sub}2 plasma
Saurabh J. Ullal; Harmeet Singh; John Daugherty; Vahid Vahedi; Eray S. Aydil
2002
2002, vol.20, no.4
Calibration stability of hot cathode ionization gauges: a discussion of the importance of electron path length and gauge constant
R. N. Peacock
2002
2002, vol.20, no.4
Atomic force microscopy observation of TiO{sub}2 films deposited by dc reactive sputtering
T. Takahashi; H. Nakabayashi; T. Terasawa; K. Masugata
2002
2002, vol.20, no.4
Influence of nitrogen and temperature on the plasma deposition of fluorinated amorphous carbon films
L. Valentini; J. M. Kenny; R. M. Montereali; L. Lozzi; S. Santucci
2002
2002, vol.20, no.4
Molecular drag model based on differential reduction of the Kruger-Shapiro equations
J. C. Helmer; G. Levi
2002
2002, vol.20, no.4
Investigation and reduction of spurious peaks caused by electronstimulated desorption and outgasing by means of grid heating method in a hot-cathode quadrupole residual gas analyzer
Fumio Watanabe
2002
2002, vol.20, no.4
Investigation of surface oxides on aluminum alloys by valence band photoemission
Gregory D. Claycomb; Peter M. A. Sherwood
2002
2002, vol.20, no.4
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