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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2002, vol.20, no.1 2002, vol.20, no.2 2002, vol.20, no.3 2002, vol.20, no.4 2002, vol.20, no.5 2002, vol.20, no.6

题名作者出版年年卷期
Growth behaviors of low-pressure metalorganic chemical vapor deposition aluminum silicate films deposited with two kinds of silicon sources: hexamethyldisilazane and tetraethyl orthosilicateDong-Hau Kuo; Po-Yo Chuang20022002, vol.20, no.5
Growth-controlled cubic zirconia microstructure in zirconia-titania nanolaminatesJ. D. DeLoach; C. R. Aita; C. -K. Loong20022002, vol.20, no.5
Ion-enhanced chemical etching of ZrO{sub}2 in a chlorine dischargeLin Sha; Byeong-Ok Cho; Jane P. Chang20022002, vol.20, no.5
Annealing behavior of a Cs{sub}2O/Cs{sub}2O{sub}2/GaAs(110) surface studied by electron spectroscopyJ. X. Wu; F. Q. Li; J. S. Zhu; M. R. Ji; M. S. Ma20022002, vol.20, no.5
Semiempirical profile simulation of aluminum etching in a Cl{sub}2/BCl{sub}3 plasmaD. J. Cooperberg; V. Vahedi; R. A. Gottscho20022002, vol.20, no.5
Transition layers in metal bilayers produced by pulsed laser deposition in vacuumA. Tselev; A. Gorbunov; W. Pompe20022002, vol.20, no.5
Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma sourceSeiji Samukawa; Keisuke Sakamoto; Katsunori Ichiki20022002, vol.20, no.5
Redeposition of etch products on sidewalls during SiO{sub}2 etching in a fluorocarbon plasma - I: effect of particle emission from the bottom surface in a CF{sub}4 plasmaJae-Ho Min; Sung-Wook Hwang; Gyeo-Re Lee; Sang Heup Moon20022002, vol.20, no.5
Thermal decomposition pathway and desorption study of isopropanol and tert-butanol on Si(100)Jaehyun Kim; Kwansoo Kim; Kijung Yong20022002, vol.20, no.5
Optimized oxygen plasma etching of polyimide films for low loss optical waveguidesNavnit Agarwal; Shom Ponoth; Joel Plawsky; P. D. Persans20022002, vol.20, no.5
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