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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2004, vol.22, no.1 2004, vol.22, no.2 2004, vol.22, no.3 2004, vol.22, no.4 2004, vol.22, no.5 2004, vol.22, no.6

题名作者出版年年卷期
Poly (ethylene terephthalate) decomposition process in oxygen plasma; emission spectroscopic and surface analysis for oxygen-plasma reactionHidetoshi Kumagai; Denbo Hiroki; Nobuyuki Fujii; Takaomi Kobayashi20042004, vol.22, no.1
Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursorJu Youn Kim; Sangwon Seo; Do Youl Kim; Hyeongtag Jeon; Yangdo Kim20042004, vol.22, no.1
Amorphous fluorocarbon polymer (a-C:F) films obtained by plasma enhanced chemical vapor deposition from perfluoro-octane (C{sub}8F{sub}18) vapor I: Deposition, morphology, structural and chemical propertiesCostel Biloiu; Ioana Arabela Biloiu; Yosuke Sakai; Yoshiyuki Suda; Akitsugu Ohta20042004, vol.22, no.1
Influence of negative son resputtering on ZnO:AI thin filmsLoren W. Rieth; Paul H. Holloway20042004, vol.22, no.1
Effect of the substrate bias voltage on the physical characteristics of copper films deposited by microwave plasma-assisted sputtering techniqueF. Thiery; Y. Pauleau; L. Ortega20042004, vol.22, no.1
Simple method of gas flow optimization in high rate deposition of SiO{sub}2 by electron cyclotron resonance plasma enhanced chemical vapor depositionD. Daineka; P. Bulkin; G. Girard; B. Drevillon20042004, vol.22, no.1
Performance of Inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film depositionKunio Okimura; Junya Oyanagi20042004, vol.22, no.1
Orientation selective epitaxial growth of CeO{sub}2(100) and CeO{sub}2(110) layers on Si(100) substratesTomoyasu lnoue; Naomichi Sakamoto; Masayuki Ohashi; Shigenari Shida; Yoshiyuki Sampei20042004, vol.22, no.1
Contrast differences between scanning ion and scanning electron microscope imagesT. Suzuki; N. Endo; M. Shibata; S. Kamasaki; T. Ichinokawa20042004, vol.22, no.1
Role of fluorocarbon film formation in the ethching of silicon, siliconT. E. F. M. Standaert; C. Hedlund; E. A. Joseph; G. S. Oehrlein; T. J. Dalton20042004, vol.22, no.1
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