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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2009, vol.27, no.1
2009, vol.27, no.2
2009, vol.27, no.3
2009, vol.27, no.4
2009, vol.27, no.5
2009, vol.27, no.6
题名
作者
出版年
年卷期
Effect of copper emitted from wafers on etch rates of insulator films in capacitively coupled fluorocarbon plasma
Shin-ichi Imai
2009
2009, vol.27, no.1
Ultrahigh-frequency microplasma jet as a low-power, high-density, and localized ions/radicals source
Hiroyuki Miyazoe; Masaki Sai; Sven Stauss; Kazuo Terashima
2009
2009, vol.27, no.1
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
Dougyong Sung; Sangmin Jeong; Youngmin Park; Vladimir N. Volynets; Andrey G. Ushakov; Gon-Ho Kim
2009
2009, vol.27, no.1
Numerical study of the sputtering in a dc magnetron
Ivan Kolev; Annemie Bogaerts
2009
2009, vol.27, no.1
Growth and characterization of TiAlN/CrAlN superlattices prepared by reactive direct current magnetron sputtering
Harish C. Barshilia; B. Deepthi; K. S. Rajam; Kanwal Preet Bhatti; Sujeet Chaudhary
2009
2009, vol.27, no.1
Plasma atomic layer etching using conventional plasma equipment
Ankur Agarwal; Mark J. Kushner
2009
2009, vol.27, no.1
Selective formation of competitive c-axis and a-axis oriented LiNbO{sub}3 epitaxial films on Al{sub}2O{sub}3(1120)
Housei Akazawa
2009
2009, vol.27, no.1
Analysis of surface roughness and its relationship with photoluminescence properties of silicon-rich oxide films
J. A. Luna-Lopez; A. Morales-Sanchez; M. Aceves-Mijares; Z. Yu; C. Dominguez
2009
2009, vol.27, no.1
Crystallographic texture control of sputtered HfN thin films using low oxygen partial pressures
D. Deniz; J. M. E. Harper
2009
2009, vol.27, no.1
Second-order resonant ZnO-based film bulk acoustic resonator devices and thermal techniques to improve their resonant characteristics
Linh Mai; Van-Su Pham; Giwan Yoon
2009
2009, vol.27, no.1
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