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期刊


ISSN1063-7397
刊名Russian Microelectronics
参考译名俄罗斯微电子学
收藏年代2002～2023



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2016, vol.45, no.1 2016, vol.45, no.2 2016, vol.45, no.3 2016, vol.45, no.4 2016, vol.45, no.5 2016, vol.45, no.6
2016, vol.45, no.7 2016, vol.45, no.8/9

题名作者出版年年卷期
Practical Aspects of Producing MIS Structures with Good Prospects Using Atomic Layer Deposition TechnologyA. J. Aliabev; A. S. Korotkov20162016, vol.45, no.4
Mode Optimization of Retrograde Pocket Doping in SOI-MOS VLSI TransistorsA. V. Amirkhanov; S. I. Volkov; A. A. Glushko; L. A. Zinchenko; V. V. Makarchuk; V. A. Shakhnov20162016, vol.45, no.4
Secondary Ion Mass Spectrometry Study of the Formation of a Nanometer Oxide Film on a Titanium Nitride SurfaceV. M. Mordvintsev; V. V. Naumov; S. G. Simakin20162016, vol.45, no.4
Relaxation Modification of the Morphology of Atomically Clean Silicon (100) Crystal Surfaces after Treatment with SHF PlasmaR. K. Yafarov20162016, vol.45, no.4
Investigation of the Properties and Manufacturing Features of Nonvolatile FRAM Memory Based on Atomic Layer DepositionO. M. Orlov; A. M. Markeev; A. V. Zenkevich; A. G. Chernikova; M. V. Spiridonov; R. A. Izmaylov; E. S. Gornev20162016, vol.45, no.4
Characteristics of the Kinetics of Periodic Structures CMP for a Nonlinear Pressure Dependence of the Polishing RateR. V. Goldstein; T. M. Makhviladze; M. E. Sarychev20162016, vol.45, no.4
Kinetics of Neutral Particles in HCl and HBr Plasmas at Low Pressures and High Electron ConcentrationsA. M. Efremov20162016, vol.45, no.4
Thin Film Negative Electrode Based on Silicon Composite for Lithium-Ion BatteriesA. A. Airapetov; S. V. Vasiliev; T. L. Kulova; M. E. Lebedev; A. V. Metlitskaya; A. A. Mironenko; N. F. Nikol'skaya; V. V. Odinokov; G. Ya. Pavlov; D. E. Pukhov; A. S. Rudyi; A. M. Skundin; V. A. Sologub; I. S. Fedorov; A. B. Churilov20162016, vol.45, no.4
A Method for Registration of Multiple Cell Upsets in High Capacity Memory Cells Induced by Single Nuclear ParticlesA. B. Boruzdina; A. V. Ulanova; A. I. Chumakov; A. V. Yanenko20162016, vol.45, no.4



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