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期刊


ISSN1063-7397
刊名Russian Microelectronics
参考译名俄罗斯微电子学
收藏年代2002～2023



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2008, vol.37, no.1 2008, vol.37, no.2 2008, vol.37, no.3 2008, vol.37, no.4 2008, vol.37, no.5 2008, vol.37, no.6

题名作者出版年年卷期
IC Performance Degradation: Simulation and ForecastingA. V. Strogonov20082008, vol.37, no.3
New Experiments on Iterative Synthesis of Combinational CircuitsP. N. Bibilo; V. I. Romanov20082008, vol.37, no.3
Improved Multistep Method of Ion Implantation into Silicon for IC ManufactureV. I. Plebanovich; A. R. Chelyadinskii; Yu. B. Vasil'ev; A. I. Gladchuk; V. E. Osipov20082008, vol.37, no.3
Depth Profiles of Refractive Index in Thermally Grown and LPCVD Oxide Films on SiliconB. M. Ayupov; S. F. Devyatova; V. G. Erkov; L. A. Semenova20082008, vol.37, no.3
Submicrometer- and Nanometer-Structure Formation on the Surface of Epitaxial IV-VI Semiconductor Films by Ar-Plasma TreatmentS. P. Zimin; E. S. Gorlachev; I. I. Amirov; M. N. Gerke20082008, vol.37, no.3
New CMOS Process Using a Thermal-Oxide Mask for Making n{sup}-- and p{sup}--WellsYu. P. Snitovsky; M. G. Krasikov20082008, vol.37, no.3
Electron-Beam-Induced Modification of PbSnTe Surface Morphology under HEED Monitoring of MBE GrowthL. A. Borynyak; A. A. Velichko; V. A. Ilyushin; D. I. Ostertak; Yu. G. Peisakhovich; N. I. Filimonova20082008, vol.37, no.3
Response of the Electron Plasma in a Thin Metal Slab to a Low-Frequency External Electric FieldA. V. Latyshev; A. A. Yushkanov20082008, vol.37, no.3



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