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期刊


ISSN1063-7397
刊名Russian Microelectronics
参考译名俄罗斯微电子学
收藏年代2002～2023



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2014 2015 2016 2017 2018 2019
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2014, vol.43, no.1 2014, vol.43, no.2 2014, vol.43, no.3 2014, vol.43, no.4 2014, vol.43, no.5 2014, vol.43, no.6
2014, vol.43, no.7 2014, vol.43, no.8

题名作者出版年年卷期
A Distribution of Ga+ Ions in a Silicon Substrate for Nano-Dimensional MaskingI. I. Bobrinetskii; V. K. Nevolin; K. A. Tsarik; A. A. Chudinov20142014, vol.43, no.1
Formation of the Nickel-Platinum Alloy Silicide Schottky BarriersV. A. Solodukha; A. S. Turtsevich; Ya. A. Solov'ev; F. F. Komarov; O. V. Mil'chanin; T. B. Kovaleva; S. V. Gaponenko20142014, vol.43, no.1
Assembly of 3D-Wares with the Use of Wire LeadoutsV. V. Zenin; A. A. Stoyanov; S. V. Petrov; S. Yu. Chistyakov20142014, vol.43, no.1
Effect of HF Discharge Structure on Etch Nonuniformity in Plasma-Chemical ReactorYu. N. Grigor'ev; A. G. Gorobchuk20142014, vol.43, no.1
Formation and Dielectric Properties of Nanolayers of Tantalum and Aluminum OxidesYu. K. Ezhovskii20142014, vol.43, no.1
Simulation of Spatially-Heterogeneous Oxygen Precipitation in Silicon with Allowance for Internal Mechanical StressesR. V. Goldshtein; T. M. Makhviladze; M. E. Sarychev20142014, vol.43, no.1
A Semianalytical Model of a Nanowire-Based Field-Effect TransistorA. N. Khomyakov; V. V. V'yurkov20142014, vol.43, no.1
A Modifying Algorithm of the Topological VLSI Layer by Dummy Filling Features Based on Modeling the Chemical-Mechanical PlanarizationA. V. Amirkhanov; A. A. Gladkykh; V. V. Makarchuk; A. A. Stolyarov; V. A. Shakhnov20142014, vol.43, no.1
Micro Systems Engineering and Digital Holographic Flash MemoryV. A. Zhukov20142014, vol.43, no.1
Investigation of the GaAs Surface after Etching in the Plasma of Mixtures HCI/Ar, HCl/Cl_2, and HCI/H_2 by Atomic-Force MicroscopyA. V. Dunaev20142014, vol.43, no.1



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