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期刊


ISSN1063-7397
刊名Russian Microelectronics
参考译名俄罗斯微电子学
收藏年代2002～2023



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2014 2015 2016 2017 2018 2019
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2014, vol.43, no.1 2014, vol.43, no.2 2014, vol.43, no.3 2014, vol.43, no.4 2014, vol.43, no.5 2014, vol.43, no.6
2014, vol.43, no.7 2014, vol.43, no.8

题名作者出版年年卷期
Nonvolatile Memory Cells Based on the Effect of Resistive Switching in Depth-Graded Ternary Hf_xAl_(1-x)O_y Oxide FilmsO. M. Orlov; A. A. Chuprik; A. S. Baturin; E. S. Gornev; K. V. Bulakh; K. V. Egorov; A. A. Kuzin; D. V. Negrov; S. A. Zaitsev; A. M. Markeev; Yu. Yu. Lebedinskii; A. V. Zablotskii20142014, vol.43, no.4
Investigation of Electrical Properties of MOS Structures with Silicon Nitride Films Doped with Rare Earth ElementsA. A. Kovalevsky; A. S. Strogova; N. S. Strogova; N. V. Babushkina20142014, vol.43, no.4
Verification of the Algorithm for Emission Tomography of Plasma Inhomogeneities in a Plasma-Chemical Reactor Using the Langmuir MultiprobeA. V. Fadeev; K. V. Rudenko20142014, vol.43, no.4
A Virtual Scanning Electron Microscope 3. A Semiempirical Model of the SEM Signal GenerationYu. A. Novikov20142014, vol.43, no.4
Formation of the Architecture of Nanodimensional Polymer Media with Quantum DotsV. Ya. Podvigalkin20142014, vol.43, no.4
High-Mode Wave Reliefs in a Spatially Nonlocal Erosion ModelA. S. Rudyi; A. N. Kulikov; D. A. Kulikov; A. V. Metlitskaya20142014, vol.43, no.4
Investigation into the Diffusion of Boron, Phosphorus, and Arsenic in Silicon during Annealing in a Nonisothermal ReactorV. I. Rudakov; V. V. Ovcharov; V. F. Lukichev; Yu. I. Denisenko20142014, vol.43, no.4
Modification of Electronic Properties of the Surface of (100) Silicon Crystals under Microwave Plasma MicromachiningR. K. Yafarov; S. A. Klimova20142014, vol.43, no.4
Method for Analyzing the Equivalence of X-ray Images of Microcircuits for Estimating the Radiation ResistanceYu. A. Ozhegin20142014, vol.43, no.4



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