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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
2000
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2013
2000, vol.18, no.1
2000, vol.18, no.6
题名
作者
出版年
年卷期
Alternating ion bombardment technique for wall surface control in depositive plasma processing
K. Nakamura; M. Ohwaki; S. Yoneda; H. Sugai
2000
2000, vol.18, no.1
Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition
Xiao-hua Chen; Zhao Yuan Ning; Dennis W. Hess; Laren M. Tolbert
2000
2000, vol.18, no.1
Analysis of alkali elements in insulators using a CAMECA IMS-6f
J. M. McKinley; F. A. Stevie; C. N. Granger; D. Renard
2000
2000, vol.18, no.1
Annealing effects on the interfacial reactions of Ni on Si{sub}0.76Ge{sub}0.24 and Si{sub}(1-x-y)Ge{sub}xC{sub}y
Jian-Shing Luo; Wen-Tai Lin; C. Y. Chang; P. S. Shih; F. M. Pan
2000
2000, vol.18, no.1
Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters
Pieter L. Swart; Beatrys M. Lacquet; Anatoli A. Chtcherbakov; Pavel V. Bulkin
2000
2000, vol.18, no.1
Biased target deposition
V. V. Zhurin; H. R. Kaufman; J. R. Kahn; T. L. Hylton
2000
2000, vol.18, no.1
Cathodic plasma polymerization and treatment by anode magnetron torch. I. the influence of operating parameters on anode magnetron torch glow discharge
J. G. Zhao; H. K. Yasuda
2000
2000, vol.18, no.1
Chemical vapor deposition of pyrolytic boron nitride from borazine
V. N. Demin; I. P. Asanov; Z. L. Akkerman
2000
2000, vol.18, no.1
Comparative study of a-C:H films for inertial confinement fusion prepared with various hydrocarbon precursors by radio frequency-plasma enhanced chemical vapor deposition
M. Theobald; J. Durand; P. Baclet; O. Legaie
2000
2000, vol.18, no.1
Consideration of local shadowing and ion beam voltage effects in the prediction of a surface evolving under ion milling
Eric J. Klein; W. Fred Ramirez
2000
2000, vol.18, no.1
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