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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2008, vol.26, no.1 2008, vol.26, no.2 2008, vol.26, no.3 2008, vol.26, no.4 2008, vol.26, no.5 2008, vol.26, no.6

题名作者出版年年卷期
Stress evolution and defect diffusion in Cu during low energy ion irradiation: Experiments and modelingWai Lun Chan; Eric Chason20082008, vol.26, no.1
Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejectionJoseph J. Vegh; David Humbird; David B. Graves20082008, vol.26, no.1
Angular etching yields of polysilicon and dielectric materials in Cl{sub}2/Ar and fluorocarbon plasmasYunpeng Yin; Herbert H. Sawin20082008, vol.26, no.1
Lithium phosphorous oxynitride films synthesized by a plasma-assisted directed vapor deposition approachYoon Gu Kim; H. N. G. Wadley20082008, vol.26, no.1
Fundamental reliability of 1.5-nm-thick silicon oxide gate films grown at 150℃ by modified reactive ion beam depositionHiroshi Yamada20082008, vol.26, no.1
Oxygen adsorption on Ag/Si(111)-7×7 surfacesZhen Zhang; Jian Jiao; Zhiquan Jiang; Dali Tan; Qiang Fu; Xinhe Bao; Xi Liu; Jinfeng Jia; Qikun Xue20082008, vol.26, no.1
Damage-free microwave-excited plasma etching without carrier deactivation of heavily doped Si under thin silicide layerTetsuya Goto; Kazuyuki Ikenaga; Akinobu Teramoto; Masaki Hirayama; Shigetoshi Sugawa; Tadahiro Ohmi20082008, vol.26, no.1
Thermotunnel refrigerator with vacuum/insulator tunnel barrier: A theoretical analysisAvto Tavkhelidze; Vasiko Svanidze; Leri Tsakadze20082008, vol.26, no.1
Tritium migration along the cryopumping sectionOleg B. Malyshev20082008, vol.26, no.1
Quantitative determination of reaction products by in-line thermal Resorption spectroscopy: The system methanol/Pd(111)E. Demirci; A. Winkler20082008, vol.26, no.1
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