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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2010, vol.28, no.1
2010, vol.28, no.2
2010, vol.28, no.3
2010, vol.28, no.4
2010, vol.28, no.5
2010, vol.28, no.6
题名
作者
出版年
年卷期
Microplasma-assisted growth of colloidal Ag nanoparticles for point-of-use surface-enhanced Raman scattering applications
Fang-Chia Chang; Carolyn Richmonds; R. Mohan Sankaran
2010
2010, vol.28, no.4
Correlation of structure and hardness of rf magnetron sputtered silicon carbonitride films
A. S. Bhattacharyya; S. K. Mishra; S. Mukherjee
2010
2010, vol.28, no.4
Surface analysis of polyimide bombarded by charged water droplets
Kenzo Hiraoka; Yuji Sakai; Yoshitoki Iijima
2010
2010, vol.28, no.4
Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition
Kousik Sivakumar; S. M. Rossnagel
2010
2010, vol.28, no.4
Properties of thin N-type Yb_(0.14)Co_4Sb_(12) and P-type Ce_(0.09)Fe_(0.67)Co_(3.33)Sb_(12) skutterudite layers prepared by laser ablation
Radek Zeipl; Jarmila Walachova; Jan Lorincik; Sergey Leshkov; Monika Josiekova; Miroslav Jelinek; Tomas Kocourek; Karel Jurek; Jiri Navratil; Ludvik Benes; Tomas Plechacek
2010
2010, vol.28, no.4
Investigation on structure and properties of arc-evaporated HfAlN hard coatings
R. Franz; C. Mitterer; M. Lechthaler; C. Polzer
2010
2010, vol.28, no.4
Growth of epitaxial iron nitride ultrathin film on zinc-blende gallium nitride
J. Pak; W. Lin; K. Wang; A. Chinchore; M. Shi; D. C. Ingram; A. R. Smith; K. Sun; J. M. Lucy; A. J. Hauser; F. Y. Yang
2010
2010, vol.28, no.4
Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N
G. Abadias; L. E. Koutsokeras; S. N. Dub; G. N. Tolmachova; A. Debelle; T. Sauvage; P. Villechaise
2010
2010, vol.28, no.4
Surface morphology of Kr~(+)-polished amorphous Si layers
A. J. R. van den Boogaard; E. Louis; E. Zoethout; S. Mullender; F. Bijkerk
2010
2010, vol.28, no.4
Investigation of the surface chemical and electronic states of pyridine-capped CdSe nanocrystal films after plasma treatments using H_2, O_2, and Ar gases
Seok-Joo Wang; Hyuncheol Kim; Hyung-Ho Park; Young-Su Lee; Hyeongtag Jeon; Ho Jung Chang
2010
2010, vol.28, no.4
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