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期刊


ISSN1063-7397
刊名Russian Microelectronics
参考译名俄罗斯微电子学
收藏年代2002～2023



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2018, vol.47, no.1 2018, vol.47, no.2 2018, vol.47, no.3 2018, vol.47, no.4 2018, vol.47, no.5 2018, vol.47, no.6
2018, vol.47, no.7 2018, vol.47, no.8

题名作者出版年年卷期
Geometric Effects in Current-Voltage Characteristics of a Cross-Shaped MDM Ni/NiO/Fe StructureI. V. Malikov; V. A. Berezin; L. A. Fomin; G. M. Mikhailov20182018, vol.47, no.3
Laser Method of Evaluating Parameters of LSI Sensitivity to the Impact of Single IonsA. I. Chumakov20182018, vol.47, no.3
Finite Element Simulation of Frequency Response of MEMS-MicrophoneD. M. Grigor’ev; I. V. Godovitsyn; V. V. Amelichev; S. S. Generalov20182018, vol.47, no.3
Investigating the Dynamic Characteristics of High-Temperature SOI CMOS VLSIC ElementsA. S. Benediktov; N. A. Shelepin; P. V. Ignatov; A. A. Mikhailov; A. G. Potupchik20182018, vol.47, no.3
Magnetic Force Microscopy of Iron and Nickel Nanowires Fabricated by the Matrix Synthesis TechniqueD. A. Bizyaev; A. A. Bukharaev; R. I. Khaibullin; N. M. Lyadov; D. L. Zagorskii; S. A. Bedin; I. M. Doludenko20182018, vol.47, no.3
Helium Bubbles Formed in Si(001) Layers after High-Dose Implantation and Thermal AnnealingA. A. Lomov; A. V. Myakonkikh; Yu. M. Chesnokov20182018, vol.47, no.3
Dependence of the Resistance of the Negative e-Beam Resist HSQ Versus the Dose in the RIE and Wet Etching ProcessesA. V. Miakonkikh; N. A. Orlikovskiy; A. E. Rogozhin; A. A. Tatarintsev; K. V. Rudenko20182018, vol.47, no.3
Calculating the High-Frequency Electrical Conductivity of a Thin Metallic Layer for an Ellipsoidal Fermi SurfaceI. A. Kuznetsova; D. N. Romanov; A. A. Yushkanov20182018, vol.47, no.3
Experimental Evaluation of Reliability of Deep Submicron SOI MOS Transistors at High TemperaturesA. S. Benediktov; N. A. Shelepin; P. V. Ignatov20182018, vol.47, no.3



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