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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2006, vol.24, no.1 2006, vol.24, no.2 2006, vol.24, no.3 2006, vol.24, no.4 2006, vol.24, no.5 2006, vol.24, no.6

题名作者出版年年卷期
Etching of ruthenium coatings in O{sub}2- and CI{sub}2-containing plasmasC. C. Hsu; J. W. Coburn; D. B. Graves20062006, vol.24, no.1
Free molecular background flow in a vacuum chamber equipped with two-sided pumpsChunpei Cai; Iain D. Boyd; Quanhua Sun20062006, vol.24, no.1
Investigation of Ni reaction with sputtered amorphous SiGe thin film on SiO{sub}2 substrateXin-Ping Qu; Peng Duan; Yan-Qing Wu; Tao Chen; Guang-Wei Wang; Guo-Ping Ru; Bing-Zong Li20062006, vol.24, no.1
Control of plasma flux composition incident on TIN films during reactive magnetron sputtering and the effect on film microstructureC. Muratore; S. G. Walton; D. Leonhardt; R. F. Fernsler20062006, vol.24, no.1
Plasma etching of HfO{sub}2 at elevated temperatures in chlorine-based chemistryM. Helot; T. Chevolleau; L. Vallier; O. Joubert; E. Blanquet; A. Pisch; P. Mangiagalli; T. Lill20062006, vol.24, no.1
Effectiveness of dilute H{sub}2 plasmas in removing boron from Si after etching of HfO{sub}2 films in BCl{sub}3 plasmasC. Wang; V. M. Donnelly20062006, vol.24, no.1
Ion-surface interactions on c-Si(001) at the radiofrequency-powered electrode in low-pressure plasmas: Ex situ spectroscopic ellipsometry and Monte Carlo simulation studyA. Amassian; P. Desjardins; L. Martinu20062006, vol.24, no.1
Optical depth profiling of strontium titanate and electro-optic lanthanum-modified lead zirconium titanate multilayer structures for active waveguide applicationsA. Amassian; M. Gaidi; M. Chaker; L. Martinu20062006, vol.24, no.1
Electrical properties of indium-tin oxide films deposited on nonheated substrates using a planar-magnetron sputtering system and a facing-targets sputtering systemHideo Iwase; Youichi Hoshi; Makoto Kameyama20062006, vol.24, no.1
SiC formation by C{sub}60 molecules as a precursor: A synchrotron-radiation photoemission study of the carbonization processC.-P. Cheng; T.-W. Pi; C.-P. Ouyang; J.-F. Wen20062006, vol.24, no.1
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