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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2006, vol.24, no.1 2006, vol.24, no.2 2006, vol.24, no.3 2006, vol.24, no.4 2006, vol.24, no.5 2006, vol.24, no.6

题名作者出版年年卷期
Thermal conductivity of AlN-diamond particulate composite films on siliconK. Jagannadham20062006, vol.24, no.4
Effects of N{sub}2 remote plasma nitridation on the structural and electrical characteristics of the HfO{sub}2 gate dielectrics grown using remote plasma atomic layer deposition methodsJihoon Choi; Seokhoon Kim; Jinwoo Kim; Hyunseok Kang; Hyeongtag Jeon; Choelhwyi Bae20062006, vol.24, no.4
Modeling of dc magnetron plasma for sputtering: Transport of sputtered copper atomsT. Yagisawa; T. Makabe20062006, vol.24, no.4
Investigation of room temperature electrical resistivities of LaNiO{sub}(3-δ) thin films deposited by rf magnetron sputtering and high oxygen-pressure processingX. D. Zhang; X. J. Meng; J. L. Sun; G. S. Wang; T. Lin; J. H. Chu20062006, vol.24, no.4
X-ray photoelectron spectroscopy study of the nucleation processes and chemistry of CdS thin films deposited by sublimation on different solar cell substrate materialsJ. P. Espinos; A. I. Martin-Concepcion; C. Mansilla; F. Yubero; A. R. Gonzalez-Elipe20062006, vol.24, no.4
Phase separation of a Ge{sub}2Sb{sub}2Te{sub}5 alloy in the transition from an amorphous structure to crystalline structuresYoungKuk Kim; S. A. Park; J. H. Baeck; M. K. Noh; K. Jeong; M.-H. Cho; H. M. Park; M. K. Lee; E. J. Jeong; D.-H. Ko; H. J. Shin20062006, vol.24, no.4
Hysteresis behavior during reactive magnetron sputtering of Al{sub}2O{sub}3 using a rotating cylindrical magnetronD. Depla; J. Haemers; G. Buyle; R. De Gryse20062006, vol.24, no.4
Reactive vacuum vapor deposition of aluminum oxide thin films by an air-to-air metallizerT. Kobayashi; Y. Itoh; Y. Nakano; E. Hirai; R. Hashimoto; S. Kamikawa20062006, vol.24, no.4
Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin filmsF. Martin; P. Muralt; M.-A. Dubois20062006, vol.24, no.4
Alternative method of using an electron beam for charge compensation during ultralow energy secondary-ion-mass spectroscopy experimentsB. Guzman de la Mata; M. G. Dowsett; R. J. H. Morris20062006, vol.24, no.4
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