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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2006, vol.24, no.1 2006, vol.24, no.2 2006, vol.24, no.3 2006, vol.24, no.4 2006, vol.24, no.5 2006, vol.24, no.6

题名作者出版年年卷期
Co-ITO granular magnetoresistance films fabricated by precipitation of magnetic nanoparticles from amorphous oxideWanti Ekawati; Ji Shi; Yoshio Nakamura; Osamu Nittono20062006, vol.24, no.2
Transparent conductive Cd{sub}3TeO{sub}6 thin films with perovskite structureHiroyuki Tetsuka; Yue Jin Shan; Keitaro Tezuka; Hideo Imoto; Kiyotaka Wasa20062006, vol.24, no.2
Raman spectroscopy study of the influence of processing conditions on the structure of polycrystalline diamond filmsR. Ramamurti; V. Shanov; R. N. Singh; S. Mamedov; P. Boolchand20062006, vol.24, no.2
Phase transformations of sputtered ZrV{sub}2 films after annealing and hydrogenationL. Q. Shi; S. L. Xu20062006, vol.24, no.2
Stress anisotropy and stress gradient in magnetron sputtered films with different deposition geometriesZ. B. Zhao; S. M. Yalisove; J. C. Bilello20062006, vol.24, no.2
Optical emission from the aggregated state in poly[2-methoxy-5-(2'-ethyl-hexyloxy)-p-phenylene vinylene]F. Kong; X. L. Wu; R. K. Yuan; C. Z. Yang; G. G. Siu; Paul K. Chu20062006, vol.24, no.2
Structural and optical characteristics of tantalum oxide grown by pulsed Nd:YAG laser oxidationE. Atanassova; G. Aygun; R. Turan; Tz. Babeva20062006, vol.24, no.2
Experimental and numerical evaluations of adhesion strength and stress in TIN films deposited on ti-implanted aluminumMing Xu; Youming Liu; Liuhe Li; Xun Cai; Qiulong Chen; Paul K. Chu20062006, vol.24, no.2
c-axis inclined ZnO films for shear-wave transducers deposited by reactive sputtering using an additional blindM. Link; M. Schreiter; J. Weber; R. Gabl; D. Pitzer; R. Primig; W. Wersing; M. B. Assouar; O. Elmazria20062006, vol.24, no.2
Effects of deposition conditions on gas-barrier performance of SiO{sub}xN{sub}y thin films formed via ion-beam-assisted vapor depositionT. Kobayashi; Y. Nakano; M. Ogawa; R. Hashimoto; S. Kamikawa; Y. Itoh20062006, vol.24, no.2
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