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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2003, vol.21, no.1 2003, vol.21, no.2 2003, vol.21, no.3 2003, vol.21, no.4 2003, vol.21, no.5 2003, vol.21, no.5sup
2003, vol.21, no.6

题名作者出版年年卷期
Ultrathin SiO{sub}2 on Si - I: quantifying and removing carbonaceous contaminationM. P. Seah; S. J. Spencer20032003, vol.21, no.2
Microstructural and surface properties of cobalt containing amorphous carbon thin film deposited by a filtered cathodic vacuum arcDaniel H. C. Chua; W. I. Milne; B. K. Tay; P. Zhang; X. Z. Ding20032003, vol.21, no.2
Unusual diffusion enhancement of Ti in ion prebombarded MgO(100) during postbombardment annealingM. Lu; C. Lupu; J. W. Rabalais20032003, vol.21, no.2
Initial deposition of calcium phosphate ceramic on polystyrene and polytetrafluoroethylene by rf magnetron sputtering depositionB. Feddes; J. G. C. Wolke; J. A. Jansen; A. M. Vredenberg20032003, vol.21, no.2
Comparison of NO titration and fiber optics catalytic probes for determination of neutral oxygen atom concentration in plasmas and postglowsMiran Mozetic; Andre Ricard; Dusan Babic; Igor Poberaj; Jacque Levaton; Virginie Monna; Uros Cvelbar20032003, vol.21, no.2
Current-pressure-voltage characteristics in a planar magnetron dischargeM. L. Escrivao; P. J. S. Pereira; M. H. Cabral; M. R. Teixeira; M. J. P. Maneira20032003, vol.21, no.2
Silicon dioxide etching yield measurements with inductively coupled fluorocarbon plasmasHeeyeop Chae; Steven A. Vitale; Herbert H. Sawin20032003, vol.21, no.2
Plasma-enhanced chemical vapor deposition of low-k dielectric films using methylsilane, dimethylsilane, and trimethylsilane precursorsQingguo Wu; Karen K. Gleason20032003, vol.21, no.2
Characterization of hydrogen etched 6H-SiC (0001) substrates and subsequently grown AlN filmsJ. D. Hartman; A. M. Roskowski; Z. J. Reitmeier; K. M. Tracy; R. F. Davis; R. J. Nemanich20032003, vol.21, no.2
Construction and performance of a low energy ion gunI. Popova; R. Muha; Z. Chen; J. T. Yates, Jr.20032003, vol.21, no.2
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