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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2003, vol.21, no.1 2003, vol.21, no.2 2003, vol.21, no.3 2003, vol.21, no.4 2003, vol.21, no.5 2003, vol.21, no.5sup
2003, vol.21, no.6

题名作者出版年年卷期
Metal-organic interface and charge injection in organic electronic devicesJ. Campbell Scott20032003, vol.21, no.3
Limits to the strength of super- and ultrahard nanocomposite coatingsS. Veprek; S. Mukherjee; P. Karvankova; H. -D. Mannling; J. L. He; K. Moto; J. Prochazka; A. S. Argon20032003, vol.21, no.3
High-temperature interaction of nitrogen with thin iron films: thermal desorption kinetics studies combined with microstructure analysis of Fe-N filmsW. Lisowski; E. G. Keim; M. A. Smithers20032003, vol.21, no.3
Interface broadening due to Ar{sup}+ ion bombardment measured on Co/Cu multilayer at grazing angle of incidenceA. Barna; M. Menyhard; G. Zsolt; A. Koos; A. Zalar; P. Panjan20032003, vol.21, no.3
Thermal stability of polycrystalline TiN/CrN superlattice coatingsQ. Yang; L. R. Zhao20032003, vol.21, no.3
Fast X-ray spectroscopy study of ethene on clean and SO{sub}4 precovered Pt{111}Adam F. Lee20032003, vol.21, no.3
Beneficial influence of continuous ion bombardment during reactive sputter deposition of chromium nitride filmsG. C. A. M. Janssen; R. Hoy20032003, vol.21, no.3
Effect of pressure on dc planar magnetron sputtering of platinumJohn H. Thomas III20032003, vol.21, no.3
Quick estimation of physical etching to SiO{sub}2 among etchers with decoupled plasma sourcesGuowen Ding; Wei-Te Wu; Steve Mak; Wai-Fan Yau20032003, vol.21, no.3
Effect of thermal annealing on the electronic properties of nitrogen doped amorphous carbon/p-type crystalline silicon heterojunction diodesL. Valentini; L. Lozzi; V. Salerni; I. Armentano; J. M. Kenny; S. Santucci20032003, vol.21, no.3
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