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期刊


ISSN0913-5685
刊名電子情報通信学会技術研究報告
参考译名电子信息通信学会技术研究报告：电子装置
收藏年代2000～2022

关联期刊参考译名收藏年代
電子情報通信学会技術研究報告电子信息通信学会技术研究报告：电子装置 


全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013 2014 2015 2016 2017
2018 2019 2020 2021 2022

2000, vol.100, no.1 2000, vol.100, no.147 2000, vol.100, no.148 2000, vol.100, no.149 2000, vol.100, no.2 2000, vol.100, no.235
2000, vol.100, no.236 2000, vol.100, no.265 2000, vol.100, no.266 2000, vol.100, no.305 2000, vol.100, no.306 2000, vol.100, no.318
2000, vol.100, no.370 2000, vol.100, no.405 2000, vol.100, no.406 2000, vol.100, no.505 2000, vol.100, no.506 2000, vol.100, no.547
2000, vol.100, no.548 2000, vol.100, no.549 2000, vol.100, no.57 2000, vol.100, no.58 2000, vol.100, no.641 2000, vol.100, no.642
2000, vol.100, no.683

题名作者出版年年卷期
Fabrication zinc oxide thin films by reactive shielded vacuum arc ion platingKeisaku Kimura; Ryuichi Miyano; Hirofumi Takikawa; Tateki Sakakibara20002000, vol.100, no.58
Conductivity type control of ZnONuttawuth Buthrath; Arun Vir Singh; Yoshihito Hiroe; Akihiro Wakahara; Akira Yoshida20002000, vol.100, no.58
Theoretical analysis of band structure of strained β-FeSi{sub}2Tsuchiya Kenji; Wu Xiaoping; Wakahara Akihiro; Yoshida Akira20002000, vol.100, no.58
Growth of CuGaS{sub}2 with buried SiO{sub}2 structure by epitaxial lateral overgrowthAkimitsu Ikeda; Masanori Hibi; Hideto Miyake; Kazumasa Hiramatsu20002000, vol.100, no.58
Growth characteristics of CdS layers on (100) GaAs by metalorganic vapor phase epitaxyH. B. Samion; Yasumitsu Tomita; Yusuke Masuda; Kazuhito Yasuda20002000, vol.100, no.58
Development of room temperature, high-resolution detector for high-energy radiationA. Nakamura; D. Noda; T. Aoki; Y. Hatanaka20002000, vol.100, no.58
Etching of silicon related materials using trifluoro-athetyl-fluoride gasYoji Saito; Hirofumi Yamazaki; Isamu Mouri20002000, vol.100, no.58
Surface nitridation process of silicon dioxide by fluorine and excited nitrogen treatment (2)Koichi Tokuda; Tatsuya Ibe; Yoji Saito20002000, vol.100, no.58
Industry growth process of nitrogen at oxynitridation, and effect to the composition of filmAkira Kawasaki; Masayuki Suzuki; Yoji Saito20002000, vol.100, no.58
SiC thin films deposition by plasma CVDH. Nonaka; T. Muramatsu; Y. Xu; H. Anma; T. Aoki; Y. Hatanaka20002000, vol.100, no.58
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