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期刊

ISSN	0734-2101
刊名	Journal of Vacuum Science & Technology
参考译名	真空科学与技术，A辑：真空、表面与膜
收藏年代	2000～2013

全部

2000	2001	2002	2003	2004	2005
2006	2007	2008	2009	2010	2011
2012	2013

2001, vol.19, no.1	2001, vol.19, no.2	2001, vol.19, no.3	2001, vol.19, no.4, P. I	2001, vol.19, no.4, P. II	2001, vol.19, no.5
2001, vol.19, no.6

题名

作者

出版年

年卷期

Epitaxial growth of TiO{sub}2 thin films by pulsed laser deposition on GaAs(100) substrates

Xiaohua Liu; X. Y. Chen; J. Yin; Z. G. Liu; J. M. Liu; X. B. Yin; G. X. Chen; M. Wang

2001

2001, vol.19, no.2

Waveguide structrue of Er-doped KTiOPO{sub}4 films on different substrates by pulsed-laser deposition

Ke-Ming Wang; Bo-Rong Shi; Nelson Cue; Yong-Yuan Zhu; Rong-Fu Xiao; Fei Lu; Hui Hu; Yao-Gang Liu

2001

2001, vol.19, no.2

Anisotropic etching of polymer films by high energy (～100s of eV) oxygen atom neutral beams

Siddhartha Panda; Demetre J. Eoonomou; Lee Chen

2001

2001, vol.19, no.2

Microstructure of Fe-N thin films prepared using an atomic nitrogen beam

N. D. Telling; G. A. Jones; C. A. Faunce; P. J. Grundy; H. J. Blythe; D. E. Joyce

2001

2001, vol.19, no.2

Epitaxial growth lf Al{sub}2O{sub}3 thin films on Si(100) using ionized beam deposition

S. W. Whangbo; Y. K. Choi; K. B. Chung; H. K. Jang; C. N. Whang

2001

2001, vol.19, no.2

Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magentron sputtering

N. Malkomes; M. Vergohl; B. Szyszka

2001

2001, vol.19, no.2

Pulsed dc magnetron discharge for high-rate sputtering of thin films

Jindrich Musil; Jan Lestina; Jaroslav Vlcek; Tomás Tolg

2001

2001, vol.19, no.2

Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma source

Xu Jun; Deng Xinlu; Yu Shiji; Lu Wenqi; Ma Tengcai

2001

2001, vol.19, no.2

Frequency-dependent pulsed direct current magnetron sputtering of titanium oxide films

J.-Y. Kim; E. Barnat; E. J. Rymaszewski; T.-M. Lu

2001

2001, vol.19, no.2

High-density plasma patterning of low dielectric constant polymers: a conparison between polytetrafluoroethylene; parylene-N; and poly(arylene ether)

T. E. F. M. Standaert; P. J. Matsuo; X. Li; G. S. Oehrlein; T.-M. Lu; R. Gutmann; C. T. Rosenmayer; J. W. Bartz; J. G. Langan; W. R. Entley

2001

2001, vol.19, no.2