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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术,A辑:真空、表面与膜
收藏年代2000~2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2001, vol.19, no.1 2001, vol.19, no.2 2001, vol.19, no.3 2001, vol.19, no.4, P. I 2001, vol.19, no.4, P. II 2001, vol.19, no.5
2001, vol.19, no.6

题名作者出版年年卷期
Synthesis of BN{sub}x-SiN{sub}y composite films by multisource plasma chemical vapor depositionRyozo Nonogaki; Suzuya Yamada; Masahiro Ibukiyama; Tetsuya Wada20012001, vol.19, no.5
Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputteringS. K. Choi; J. I. Lee20012001, vol.19, no.5
Dynamic mixing deposition of niobium nitride films by cathodic arc plasma in ambient nitrogenT. Zhang; J. H. Song; X. B. Tian; P. K. Chu; I. G. Brown20012001, vol.19, no.5
Low temperature work function variations of the Au/GaSb(110) interface: experimental results and theoretical modelC. Guasch; A. Doukkali; J. Bonnet20012001, vol.19, no.5
Solid particle production in fluorocarbon plasmas. I. correlation with polymer film depositionKazuo Takahashi; Kunihide Tachibana20012001, vol.19, no.5
Vapor-phase oxidation during pulsed laser deposition of SrBi{sub}2 Ta{sub}2O{sub}9C. Christou; A. Garg; Z. H. Barber20012001, vol.19, no.5
Stabilization of zinc-blende cubic AIN in AIN/W superlatticesI. W. Kim; A. Madan; M. W. Guruz; V. P. Dravid; S. A. Barnett20012001, vol.19, no.5
Effects of wall contamination on consecutive plasma processesH. K. Yasuda; Q. S. Yu; C. M. Reddy; C. E. Moffitt; D. M. Wieliczka20012001, vol.19, no.5
Changes in surface states during epitaxial growth of BaTiO{sub}3 on SrTiO{sub}3 substrate in connection with composition deviationK. Shimoyama; K. Kubo; M. Iida; K. Yamabe; T. Maeda20012001, vol.19, no.5
Relationship of etch reaction and reactive species flux in C{sub}4F{sub}8/Ar/O{sub}2 plasma for SiO{sub}2 selective etching over Si and Si{sub}3N{sub}4Miyako Matsui; Tetsuya Tatsumi; Makoto Sekine20012001, vol.19, no.5
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