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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
2000
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2001, vol.19, no.1
2001, vol.19, no.2
2001, vol.19, no.3
2001, vol.19, no.4, P. I
2001, vol.19, no.4, P. II
2001, vol.19, no.5
2001, vol.19, no.6
题名
作者
出版年
年卷期
Synthesis of BN{sub}x-SiN{sub}y composite films by multisource plasma chemical vapor deposition
Ryozo Nonogaki; Suzuya Yamada; Masahiro Ibukiyama; Tetsuya Wada
2001
2001, vol.19, no.5
Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputtering
S. K. Choi; J. I. Lee
2001
2001, vol.19, no.5
Dynamic mixing deposition of niobium nitride films by cathodic arc plasma in ambient nitrogen
T. Zhang; J. H. Song; X. B. Tian; P. K. Chu; I. G. Brown
2001
2001, vol.19, no.5
Low temperature work function variations of the Au/GaSb(110) interface: experimental results and theoretical model
C. Guasch; A. Doukkali; J. Bonnet
2001
2001, vol.19, no.5
Solid particle production in fluorocarbon plasmas. I. correlation with polymer film deposition
Kazuo Takahashi; Kunihide Tachibana
2001
2001, vol.19, no.5
Vapor-phase oxidation during pulsed laser deposition of SrBi{sub}2 Ta{sub}2O{sub}9
C. Christou; A. Garg; Z. H. Barber
2001
2001, vol.19, no.5
Stabilization of zinc-blende cubic AIN in AIN/W superlattices
I. W. Kim; A. Madan; M. W. Guruz; V. P. Dravid; S. A. Barnett
2001
2001, vol.19, no.5
Effects of wall contamination on consecutive plasma processes
H. K. Yasuda; Q. S. Yu; C. M. Reddy; C. E. Moffitt; D. M. Wieliczka
2001
2001, vol.19, no.5
Changes in surface states during epitaxial growth of BaTiO{sub}3 on SrTiO{sub}3 substrate in connection with composition deviation
K. Shimoyama; K. Kubo; M. Iida; K. Yamabe; T. Maeda
2001
2001, vol.19, no.5
Relationship of etch reaction and reactive species flux in C{sub}4F{sub}8/Ar/O{sub}2 plasma for SiO{sub}2 selective etching over Si and Si{sub}3N{sub}4
Miyako Matsui; Tetsuya Tatsumi; Makoto Sekine
2001
2001, vol.19, no.5
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